WebCPA Sputter System NNI Oregon State University Materials Synthesis and Characterization Facility (MaSC) Thin Film Processing Dielectric Sputter Description Side sputter with 1 3" and 1 2" source for metal oxide deposition. Maximum Substrate Size 2 inch See More Rate Information WebCPA Sputter System NNI Oregon State University Materials Synthesis and Characterization Facility (MaSC) Thin Film Processing Dielectric Sputter Description Side sputter with 1 …
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WebFeatures. vacuum load lock sputtering system with tray handling ø320mm. four cathodes each ø100mm with shutter. co-sputtering, DC, puls-DC, RF. adjustable distance T/S from 60 to 180mm. roughness of ≤0.5nm after annealing @2000°C for sputtered carbon cap @RT. footprint 0.9m x 2.3m. WebAJA ATC 2200 UHV Sputtering System: Sputter: 105: AJA ATC Orion 8 UHV Sputtering System: Sputter: 106: AJA DC Sputter Deposition Tool: Sputter: 107: AJA Evaporator: Evaporation: 109: AJA Orion 8 Sputter System: Sputter: 110: ... CPA S-Gun Sputter Deposition: CVC AST-601 Sputter: Emscope SC-650 Series: jtb 台湾 パンフレット
CPA 9900-1 used for sale price #9173304 > buy from CAE
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